Semi-automated three vessel wetbenches that complement the features and benefits of the HF RFEB and the HT Lite with APM  (SC-1) cleaning capability for excellent particle removal efficiency (>95%) and high purity oxide surface passivation for applications requiring this surface termination.
The HF RFEB or HT-Lite combined with the QDR  may also be used to strip thicker oxide and nitride layers on silicon wafers.

  Main Features:

 All of the same features that come with the HF RFEB and HT Lite 

Verteq’s Sunburst Turbo Megasonic process vessel with an in-line heater and filter loop

Proprietary high efficiency quick dump rinser (QDR)

Linear robotic transfer system (for the wafer cassettes)

Accommodates the processing of two 200mm or 300mm cassettes